Neutron soft error rate measurements in a 90-nm CMOS process and scaling trends in SRAM from 0.25-/spl mu/m to 90-nm generation

P. Hazucha, T. Karnik, J. Maiz, S. Walstra, B. Bloechel, J. Tschanz, G. Dermer, S. Hareland, P. Armstrong, S. Borkar
{"title":"Neutron soft error rate measurements in a 90-nm CMOS process and scaling trends in SRAM from 0.25-/spl mu/m to 90-nm generation","authors":"P. Hazucha, T. Karnik, J. Maiz, S. Walstra, B. Bloechel, J. Tschanz, G. Dermer, S. Hareland, P. Armstrong, S. Borkar","doi":"10.1109/IEDM.2003.1269336","DOIUrl":null,"url":null,"abstract":"The neutron soft error rate (SER) dependency on voltage and area was measured for a state-of-the-art 90-nm CMOS technology. The SER increased by 18% for a 10% reduction in voltage, and scaled linearly with diode area. The measured SER per bit of SRAMs in 0.25 /spl mu/m, 0.18 /spl mu/m, 0.13 /spl mu/m, and 90 nm showed an increase of 8% per generation.","PeriodicalId":344286,"journal":{"name":"IEEE International Electron Devices Meeting 2003","volume":"126 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"172","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Electron Devices Meeting 2003","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2003.1269336","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 172

Abstract

The neutron soft error rate (SER) dependency on voltage and area was measured for a state-of-the-art 90-nm CMOS technology. The SER increased by 18% for a 10% reduction in voltage, and scaled linearly with diode area. The measured SER per bit of SRAMs in 0.25 /spl mu/m, 0.18 /spl mu/m, 0.13 /spl mu/m, and 90 nm showed an increase of 8% per generation.
90纳米CMOS工艺的中子软错误率测量和SRAM从0.25-/spl mu/m到90纳米一代的缩放趋势
采用最先进的90纳米CMOS技术测量了中子软错误率(SER)与电压和面积的关系。由于电压降低10%,SER增加了18%,并且与二极管面积成线性比例。在0.25 /spl mu/m、0.18 /spl mu/m、0.13 /spl mu/m和90 nm的sram中,每代SER提高了8%。
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