Influence of deep level defects on photoelectrical processes in p-n junction solar cells with porous silicon antireflection coating

V. V. Tregulov, V. Litvinov, A. Ermachikhin, A. D. Maslov
{"title":"Influence of deep level defects on photoelectrical processes in p-n junction solar cells with porous silicon antireflection coating","authors":"V. V. Tregulov, V. Litvinov, A. Ermachikhin, A. D. Maslov","doi":"10.1109/ELEKTRO49696.2020.9130303","DOIUrl":null,"url":null,"abstract":"In this paper we investigated n+-p-junction silicon solar cells with antireflection por-Si film, formed on the front surface by anodic electrochemical etching. Photocurrent of the samples is measured. Also we used current deep level transient spectroscopy method. We found that defects with deep levels, appeared during formation of por-Si layer strongly affect photocurrent spectra of the cells due to the amplification of recombination of photogenerated charge carriers.","PeriodicalId":165069,"journal":{"name":"2020 ELEKTRO","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 ELEKTRO","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ELEKTRO49696.2020.9130303","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

In this paper we investigated n+-p-junction silicon solar cells with antireflection por-Si film, formed on the front surface by anodic electrochemical etching. Photocurrent of the samples is measured. Also we used current deep level transient spectroscopy method. We found that defects with deep levels, appeared during formation of por-Si layer strongly affect photocurrent spectra of the cells due to the amplification of recombination of photogenerated charge carriers.
深层缺陷对多孔硅增透p-n结太阳能电池光电过程的影响
本文研究了在n+-p结硅太阳电池的前表面通过阳极电化学蚀刻形成增透孔硅膜。测量了样品的光电流。我们还采用了电流深层瞬态光谱方法。我们发现,在孔硅层形成过程中出现的深能级缺陷,由于光生载流子的重组放大,强烈地影响了电池的光电流光谱。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信