Measurement of defects by measuring of light scattering from surfaces using focused illumination

O. Rodríguez-Núñez, N. Bruce
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Abstract

Light scattering has been used as a method of characterizing material or surface roughness in different areas of the science and technology, usually the surface is illuminated with light and the pattern of scattering is measured above the surface. In the literature, the scattered light has been measured using an incident beam with a diameter on the order of a few cm for surfaces with roughness scales of the order of microns, mainly to avoid problems with the speckle pattern of light. However, this kind of measurement does not give information on local variations in roughness or defects present in the sample. Also, it has been reported in many studies that the polarization of the scattered light is affected by the surface material and roughness. In this paper we present a novel experimental device used to identify local defects on surfaces by the measurement of the scattered light pattern using laser light focused onto the surface. We present results of experimental measurements for two surfaces with roughness and defects of the order of 6 to 60 microns using sizes of incident beam of the same order and we compare the results of experimental cases with results of numerical calculation based on the Kirchhoff Approximation of light scattering by rough surfaces. We include preliminary results from the effect on the pattern of light scattering as a function of the polarization state by using focused light to illuminate the surface, we calculate the Mueller matrix for the equivalent period of the surface micro-manufactured experimentally. Finally we conclude about the validity of the method.
用聚焦照明测量表面的光散射来测量缺陷
光散射在不同的科学技术领域被用作表征材料或表面粗糙度的一种方法,通常是用光照射表面并测量表面上方的散射模式。在文献中,对于微米级粗糙度的表面,散射光的测量使用了直径为几厘米的入射光束,主要是为了避免光的散斑模式问题。然而,这种测量并不能提供样品中粗糙度或缺陷局部变化的信息。此外,许多研究报道散射光的偏振受表面材料和粗糙度的影响。本文提出了一种利用激光聚焦在表面上,通过测量散射光模式来识别表面局部缺陷的实验装置。本文给出了两种具有6 ~ 60微米量级的粗糙度和缺陷的表面的实验测量结果,并将实验结果与基于Kirchhoff近似的粗糙表面光散射数值计算结果进行了比较。我们包括了用聚焦光照射表面对光散射模式作为偏振态函数的影响的初步结果,我们计算了实验中微制造表面等效周期的Mueller矩阵。最后对该方法的有效性进行了总结。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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