3D RRAMs with Gate-All-Around Stacked Nanosheet Transistors for In-Memory-Computing

Abstract

This paper explores a novel 3D one transistor / one RRAM (1T1R) memory cube. The proposed architecture integrates HfO2-based OxRAM with select junctionless (JL) transistors based on low-voltage Gate-All-Around (GAA) stacked NanoSheet (NS) technology. A bitcell size of 23.9×F2/N is achieved (‘N’ being the number of stacked-NS) as well as a very high write and read parallelism. Extensive characterization of JL transistors and OxRAMs is performed to show their ability to be co-integrated inside a same 1T1R memory cell. Electrical characterization of 4kbits OxRAM arrays shows a large memory window (HRS/LRS=20) up to 104 cycles with a current compliance of 150µA, compatible with the performances of our JL transistors. Then, we experimentally demonstrate scouting logic operations capability with 2 operands, which should be extended to 4 operands thanks to an original two cells/bit “double coding” scheme assessed by SPICE simulations. Finally, we evidenced that this computing scheme is 2 times more energy efficient than a write-verify approach.