Nanotribological behaviors of friction-induced hillocks on monocrystalline silicon

Long Hua, Bingjun Yu, Chen Song, L. Qian, Zhongrong Zhou
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Abstract

With an atomic force microscope, friction and wear behaviors of the friction induced hillocks on monocrystalline silicon were investigated. With the increase of normal load from one to twelve microNewtown, the friction force on silicon substrate showed a sharp increase at eight microNewtown, while the friction force on the hillocks kept a stably linear increase. Since no scratch damage was detected on the hillock below a contact pressure of ten point three gigaPascal, the friction induced hillocks on silicon can withstand the typical contact and sliding in dynamic devices. It was also noted that the friction induced hillock presented anisotropic friction and wear behaviors during scratching. The sliding parallel to the scanning direction for producing the hillock can reduce the friction in dynamic devices. This study can shed new light on potential application of the friction induced nanostructures.
单晶硅摩擦诱导丘的纳米摩擦学行为
利用原子力显微镜研究了单晶硅表面摩擦丘的摩擦磨损行为。随着法向载荷从1微纽镇增加到12微纽镇,硅衬底上的摩擦力在8微纽镇时急剧增加,而小丘上的摩擦力则保持稳定的线性增加。由于在接触压力低于10.3千兆帕斯卡的情况下,没有检测到划痕损伤,因此硅上的摩擦诱发的小丘可以承受动态设备中典型的接触和滑动。摩擦诱发丘在刮擦过程中表现出各向异性的摩擦磨损行为。平行于扫描方向的滑动产生小丘可以减少动态装置的摩擦。该研究为摩擦诱导纳米结构的潜在应用提供了新的思路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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