C. Wei, A. Metzger, Y. Zhu, C. Cismaru, A. Klimashov, P. Zampardi, R. Ramanrata, Y. Tkachenko
{"title":"DC/RF and Statistic Modeling of Four Terminal InGap/GaAs Bifet for wireless application","authors":"C. Wei, A. Metzger, Y. Zhu, C. Cismaru, A. Klimashov, P. Zampardi, R. Ramanrata, Y. Tkachenko","doi":"10.1109/EMICC.2006.282812","DOIUrl":null,"url":null,"abstract":"InGaP-GaAs based BIFET is a novel technology that integrates HBT and FET onto a single wafer. The technique expands functionality of circuits and reduces the cost. A novel four-terminal large-signal model was developed for accurate DC and RF applications. The device has a p-layer as backgate that has significant impact on the DC/RF characteristics and therefore, the drain current, gate current, leakage current and all charges/capacitances are 3-dimensional functions, which increases the complexity of the model. The model predicts very well IV/leakage curves for all configurations, including the cases when backgate is connected to source or to gate in that the device reduces to three-terminal. For the three terminal cases, the model also predicts RF performances. Statistic model is also presented to predict the variation of Idss/Vp as well as the corner models that define the extremes of characteristics in terms of epi-layer structure","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 European Microwave Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EMICC.2006.282812","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
InGaP-GaAs based BIFET is a novel technology that integrates HBT and FET onto a single wafer. The technique expands functionality of circuits and reduces the cost. A novel four-terminal large-signal model was developed for accurate DC and RF applications. The device has a p-layer as backgate that has significant impact on the DC/RF characteristics and therefore, the drain current, gate current, leakage current and all charges/capacitances are 3-dimensional functions, which increases the complexity of the model. The model predicts very well IV/leakage curves for all configurations, including the cases when backgate is connected to source or to gate in that the device reduces to three-terminal. For the three terminal cases, the model also predicts RF performances. Statistic model is also presented to predict the variation of Idss/Vp as well as the corner models that define the extremes of characteristics in terms of epi-layer structure