A germanium NMOSFET process integrating metal gate and improved hi-/spl kappa/ dielectrics

Abstract

A simple and novel self-aligned gate-last MOS process integrating metal gates and high-k dielectrics on Ge has been demonstrated. Improved surface passivation for excellent gate dielectric and field isolation, and n-type dopant incorporation with high surface concentration and shallow junctions has been developed. Conventional VLSI type Ge n-MOSFETs have been fabricated.