Interconnect BIST based new self-repairing of TSV defect in 3D-IC

M. Benabdeladhim, A. Fradi, B. Hamdi
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引用次数: 1

Abstract

This paper presents an Interconnect Built-In Self-Repair (IBISR) strategies for Through Silicon Via (TSV) in three dimension integrated circuits (3D-IC). The proposed IBISR structure focuses on testing of specific defective TSV by using Interconnect BIST methodology. After interconnect test, the result giving will be delivered to the BISR structure for repairing TSV defects. Additionally, a parallel processing approach is presented of the proposed IBISR structure to up grit speed of operations of test and repair. Experimental results demonstrate that the proposed IBISR scheme can achieve the good performance in repair rate and yield with little area overhead penalty.
基于互连BIST的3d集成电路TSV缺陷自修复新方法
提出了一种三维集成电路(3D-IC)中通硅孔(TSV)的互连内置自修复(IBISR)策略。提出的IBISR结构侧重于使用Interconnect BIST方法对特定缺陷TSV进行测试。互连测试完成后,将测试结果传递给BISR结构,用于修复TSV缺陷。此外,提出了IBISR结构的并行处理方法,以提高测试和维修操作的速度。实验结果表明,所提出的IBISR方案在修复率和成品率方面具有良好的性能,且面积开销损失小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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