Nano-Scaled ZnO Based RRAM with Memristive Behavior Fabricated by Dual Ion Beam Sputtering

Amitesh Kumar, Mangal Das, Biswajit Mandal, R. Bhardwaj, Aaryashree, A. Kranti, S. Mukherjee
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Abstract

This work reports forming-free (FF) resistive switching (RS) with high endurance and retention for ZnO based thin films fabricated by dual ion beam sputtering (DIBS). Undoped and Ga-doped ZnO thin films have been used to compare the effect of doping upon RS behavior.
双离子束溅射制备具有记忆阻性的纳米ZnO RRAM
本文报道了双离子束溅射(DIBS)制备的ZnO基薄膜具有高耐用性和保持性的无形成(FF)电阻开关(RS)。无掺杂和Ga-doped氧化锌薄膜用于比较掺杂在RS行为的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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