{"title":"Fully-integrated Capacitive Cross-Coupled Class-D Oscillator with Frequency Doubler","authors":"Ho‐Chang Lee, S. Jang, Yu-Chi Wang","doi":"10.1109/iWEM49354.2020.9237403","DOIUrl":null,"url":null,"abstract":"This letter designs a class-D oscillator with frequency doubler implemented in the TSMC standard 0.18 µm BiCMOS processes. The die area is 1x1 mm2. At the supply voltage of 0.4 V below the nominal threshold voltage, the n-core oscillator outputs a frequency source at 2.80 GHz. This class-D oscillator with frequency doubler is made of a parallel LC resonator and a capacitive cross-coupled MOSFET pair with inductive gate voltage booting, which enables the class-D mode operation by switching the FETs to deep cut-off region in shorter time.","PeriodicalId":201518,"journal":{"name":"2020 International Workshop on Electromagnetics: Applications and Student Innovation Competition (iWEM)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-08-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Workshop on Electromagnetics: Applications and Student Innovation Competition (iWEM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/iWEM49354.2020.9237403","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This letter designs a class-D oscillator with frequency doubler implemented in the TSMC standard 0.18 µm BiCMOS processes. The die area is 1x1 mm2. At the supply voltage of 0.4 V below the nominal threshold voltage, the n-core oscillator outputs a frequency source at 2.80 GHz. This class-D oscillator with frequency doubler is made of a parallel LC resonator and a capacitive cross-coupled MOSFET pair with inductive gate voltage booting, which enables the class-D mode operation by switching the FETs to deep cut-off region in shorter time.