Effects of parasitic fringe capacitance on threshold voltage of underlap DG-MOSFET

P. Verma, Ashutosh Nandi
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Abstract

A compact model for the effect of parasitic fringe capacitance on the threshold voltage of a gate to source/drain (S/D) underlapped double-gate (DG)-MOSFET is developed. The authors' model includes the effects of channel thickness, oxide thickness and dielectric constant of a MOSFET structure. A simple expression is derived for the fringe capacitance and the threshold voltage. In this model, we show the effect of fringe capacitance on the threshold voltage by varying the channel thickness, oxide thickness, and dielectric constant.
寄生条纹电容对下搭接DG-MOSFET阈值电压的影响
建立了寄生条纹电容对栅极-源极/漏极(S/D)叠置双栅(DG)-MOSFET阈值电压影响的紧凑模型。该模型考虑了MOSFET结构的沟道厚度、氧化物厚度和介电常数的影响。导出了条纹电容和阈值电压的简单表达式。在这个模型中,我们通过改变通道厚度、氧化物厚度和介电常数来显示条纹电容对阈值电压的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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