Wo 3-X/Si N-N Homotype Heterojunction with High Performance Photodetection Characteristics

Xiwei Zhang, Yiwen Su, Zhenjie Tang, D. Hu, Zhi Wang, Yuexin Hou, Xinmiao Wang
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引用次数: 10

Abstract

Abstract WO3 has a great potential in the field of optoelectronics. Herein, sub-stoichiometric WO3-x thin film is prepared and WO3-x/Si n-n homotype heterojunction with pronounced rectifying behavior is constructed. Moreover, the heterojunction exhibits excellent photodetection characteristics, including a large responsivity of 72.8 A/W, a high specific detectivity of 3.96 × 1011 Jones and fast response times of 5.8 μs/1.27 ms. The mechanism of photoinduced charge separation and transfer in the WO3-x/Si n-n homotype heterojunction is analyzed by Kelivn probe force microscopy. These results suggest that the WO3-x/Si n-n homotype heterojunction is of excellent performance in the field of optoelectronic application.
具有高性能光电探测特性的Wo 3-X/Si N-N同型异质结
摘要:WO3在光电子学领域具有巨大的应用潜力。本文制备了亚化学计量WO3-x薄膜,并构建了具有明显整流行为的WO3-x/Si n-n同型异质结。此外,该异质结具有良好的光探测特性,具有72.8 a /W的高响应率、3.96 × 1011 Jones的高比探测率和5.8 μs/1.27 ms的快速响应时间。利用Kelivn探针力显微镜分析了WO3-x/Si n-n同型异质结中光诱导电荷分离和转移的机理。这些结果表明,WO3-x/Si n-n异质结在光电应用领域具有优异的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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