Design and optimization of a low-voltage shunt capacitive RF-MEMS switch

M. Ya, N. Soin, A. Nordin
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引用次数: 8

Abstract

This paper presents the design, optimization and simulation of a radio frequency (RF) micro-electromechanical system (MEMS) switch. The device is a capacitive shunt-connection switch, which uses four folded beams to support a big membrane above the signal transmission line. Another four straight beams provide the bias voltage. The switch is designed in 0.35μm complementary metal oxide semiconductor (CMOS) process and is electrostatically actuated by a low pull-in voltage of 2.9V. Taguchi Method is employed to optimize the geometric parameters of the beams, in order to obtain a low spring constant and a robust design. The pull-in voltage, vertical displacement, and maximum von Mises stress distribution was simulated using finite element modeling (FEM) simulation - IntelliSuite v8.7® software. With Pareto ANOVA technique, the percentage contribution of each geometric parameter to the spring constant and stress distribution was calculated; and then the optimized parameters were got as t=0.877μm, w=4μm, L1=40μm, L2=50μm and L3=70μm. RF performance of the switch was simulated by AWR Design Environment 10® and yielded isolation and insertion loss of -23dB and -9.2dB respectively at 55GHz.
低压并联电容式RF-MEMS开关的设计与优化
本文介绍了一种射频(RF)微机电系统(MEMS)开关的设计、优化和仿真。该装置是一种电容并联开关,它使用四个折叠梁来支撑信号传输线上方的大膜。另外四个直光束提供偏置电压。该开关采用0.35μm互补金属氧化物半导体(CMOS)工艺设计,由2.9V的低拉入电压静电驱动。采用田口法对梁的几何参数进行优化,使梁具有较低的弹性常数和较强的鲁棒性。使用有限元建模(FEM)仿真- IntelliSuite v8.7®软件模拟拉入电压、垂直位移和最大von Mises应力分布。利用Pareto方差分析技术,计算各几何参数对弹簧常数和应力分布的贡献百分比;优化后的参数为t=0.877μm, w=4μm, L1=40μm, L2=50μm, L3=70μm。通过AWR Design Environment 10®对开关的射频性能进行了仿真,在55GHz时产生的隔离和插入损耗分别为-23dB和-9.2dB。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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