{"title":"Poole-Frenkel conduction in antimony-doped tin selenide thin films","authors":"S. Sakrani, S. A. Jabar","doi":"10.1117/12.300686","DOIUrl":null,"url":null,"abstract":"Tin selenide thin films have been prepared onto glass substrates at a temperature 240 degrees Celsius and fixed film thickness by means of a solid state reaction process at pressure about 10-5 mbar. Low level antimony doping was maintained at a concentration 1.8%. The dark current- voltage measurements have been performed on the sandwiched structures of Al-SnSe-Al and Al-SnSe:Sb-Al at temperatures in the range 143 - 300 K, and the results showed a ln J varies direct as V1/2 dependence which was indicative of the Poole-Frenkel effect. It was found that, the calculated field-lowering coefficients, (beta) p for the latter samples (3.71 - 4.81 X 10-5 eV m1/2 V-1/2) were higher than the predicted value (2.18 X 10-5 eV m1/2 V-1/2) by a factor of 1.71 - 2.21. These were further confirmed by the linear dependence of the graphs's slope and inverse of temperature. The results were explained in terms of lowering potential barrier by the interaction of electron with applied electric field.","PeriodicalId":362287,"journal":{"name":"Thin Film Physics and Applications","volume":"79 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Film Physics and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.300686","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Tin selenide thin films have been prepared onto glass substrates at a temperature 240 degrees Celsius and fixed film thickness by means of a solid state reaction process at pressure about 10-5 mbar. Low level antimony doping was maintained at a concentration 1.8%. The dark current- voltage measurements have been performed on the sandwiched structures of Al-SnSe-Al and Al-SnSe:Sb-Al at temperatures in the range 143 - 300 K, and the results showed a ln J varies direct as V1/2 dependence which was indicative of the Poole-Frenkel effect. It was found that, the calculated field-lowering coefficients, (beta) p for the latter samples (3.71 - 4.81 X 10-5 eV m1/2 V-1/2) were higher than the predicted value (2.18 X 10-5 eV m1/2 V-1/2) by a factor of 1.71 - 2.21. These were further confirmed by the linear dependence of the graphs's slope and inverse of temperature. The results were explained in terms of lowering potential barrier by the interaction of electron with applied electric field.
在约10- 5mbar的压力下,采用固相反应工艺,在温度240℃、膜厚固定的条件下,在玻璃基板上制备了硒化锡薄膜。低浓度锑掺杂维持在1.8%的浓度。在143 ~ 300 K的温度范围内对Al-SnSe- al和Al-SnSe:Sb-Al夹层结构进行了暗电流-电压测量,结果表明,lnj与V1/2成正比,表明存在普尔-弗伦克尔效应。结果表明,后一种样品的降场系数(β) p (3.71 ~ 4.81 X 10-5 eV m1/2 v /2)比预测值(2.18 X 10-5 eV m1/2 v /2)高1.71 ~ 2.21倍。图的斜率和温度的反比的线性关系进一步证实了这一点。从电子与外加电场相互作用降低势垒的角度解释了这一结果。