Unstressed nickel chromium thin films for thermo-optic application

1998 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings (Cat. No.98EX140) Pub Date : 1998-12-14 DOI:10.1109/COMMAD.1998.791676

D. Di Mola, L. Brioschi, A. Carrera, F. Fusari, M. Lenzi, G. Ongaro

引用次数: 5

Abstract

The sputtering deposition technique has been used to realize nickel chromium thin films up to 12000 /spl Aring/ thick. The radio frequency biasing of the silica substrate has been implemented to control the film stress. Application of these films used as "heater electrodes" in thermo-optical devices has been reported.

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热光学用无应力镍铬薄膜

采用溅射沉积技术可实现12000 /spl /厚的镍铬薄膜。采用射频偏置的方法来控制薄膜应力。这些薄膜作为“加热电极”在热光学器件中的应用已被报道。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

1998 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings (Cat. No.98EX140)

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