Noise performance of 90 nm CMOS technology

D. Becher, G. Banerjee, R. Basco, C. Hung, K. Kuhn, W. Shih
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引用次数: 8

Abstract

This work describes the noise figure performance of CMOS transistors at the 90 nm technology node. Noise parameters are measured from 2-18 GHz, resulting in a minimum noise figure less than 2 dB across the range of measured frequencies for both NMOS and PMOS. Data is presented showing the effect of total gate width, gate length, and bias on the noise parameters.
90纳米CMOS技术的噪声性能
本文描述了CMOS晶体管在90nm工艺节点上的噪声系数性能。噪声参数测量范围为2-18 GHz,因此在NMOS和PMOS的测量频率范围内,最小噪声系数小于2 dB。数据显示了总栅极宽度、栅极长度和偏置对噪声参数的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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