{"title":"A high quality 1-V Josephson series array developed at KRISS","authors":"Se Ii Park, Kyu-Tae Kim, R. Lee","doi":"10.1109/CPEM.1994.333431","DOIUrl":null,"url":null,"abstract":"By combining the selective niobium anodization process (SNAP) and the image reversal technique (IRT) a new fabrication process of integrated Josephson series array has been developed at KRISS. The array containing 2520 Nb/Al/sub 2/O/sub 3//Nb tunnel junctions produced stable quantized voltage steps up to 2 V with stability times of more than 5-h.<<ETX>>","PeriodicalId":388647,"journal":{"name":"Proceedings of Conference on Precision Electromagnetic Measurements Digest","volume":"193 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of Conference on Precision Electromagnetic Measurements Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CPEM.1994.333431","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
By combining the selective niobium anodization process (SNAP) and the image reversal technique (IRT) a new fabrication process of integrated Josephson series array has been developed at KRISS. The array containing 2520 Nb/Al/sub 2/O/sub 3//Nb tunnel junctions produced stable quantized voltage steps up to 2 V with stability times of more than 5-h.<>