Semi-insulating InP:Fe grown on Si

R. Schnabel, F. Heinrichsdorff, A. Krost, M. Grundmann, T. Wolf, K. Schatke, D. Bimberg, M. Pilatzek, P. Harde
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Abstract

Metal organic chemical vapor deposition of undoped and Fe-doped InP on vicinal Si[001] and Si(111) is reported. Semi-insulating InP on Si(111) with a resistivity of 3 /spl times/ 10/sup 7/ /spl Omega/cm has been made for the first time. The resistivity increases with decreasing defect density in the InP:Fe epitaxial layers. In InP/Si(111), a considerable reduction of crystal defects by one order of magnitude was found as compared to InP/Si[001]. In consequence, the undesired defect induced effects of strong Si incorporation and incorporation of electrically inactive Fe are almost suppressed.<>
生长在Si上的半绝缘InP:Fe
报道了未掺杂和掺铁InP在相邻Si[001]和Si(111)上的金属有机化学气相沉积。首次制成了电阻率为3 /spl × / 10/sup / 7/ spl ω /cm的半绝缘InP on Si(111)。在InP:Fe外延层中,电阻率随缺陷密度的减小而增大。在InP/Si(111)中,与InP/Si相比,晶体缺陷显著减少了一个数量级[001]。因此,强Si掺入和非电活性Fe掺入所引起的缺陷效应几乎被抑制
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