Low resistance contact to CdTe thin films

M. Flórez, W. De La Cruz, P. Teherán, L. Cota, G. Gordillo
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引用次数: 1

Abstract

A new procedure to realize low resistance contact to polycrystalline CdTe thin films for solar cells deposited by CSS method is presented. Initially, the CdTe samples are etched with an oxidant agent in order to form a Te-rich surface layer; subsequently the CdTe samples are dipped in a CuCl solution to form a p/sup +/-Cu/sub x/Te (1/spl les/x/spl les/2) layer through an ion-exchange chemical reaction; finally, the samples were contacted with Cu and Cu/Au deposited by thermal evaporation and C:Cu deposited by DC magnetron sputtering. Contact resistivities of 0.16 /spl Omega/cm/sup 2/ were obtained using sulphochromic solution as oxidant agent and Cu as electrical contact. The changes induced in the CdTe-surface by the different surface treatments were studied by means of XRD and AES measurements.
低电阻接触CdTe薄膜
提出了一种用CSS法沉积太阳能电池用多晶CdTe薄膜实现低电阻接触的新工艺。首先,用氧化剂蚀刻CdTe样品以形成富te表面层;然后将CdTe样品浸入CuCl溶液中,通过离子交换化学反应形成p/sup +/-Cu/sub x/Te (1/spl les/x/spl les/2)层;最后,将样品与Cu、热蒸发沉积的Cu/Au和直流磁控溅射沉积的C:Cu接触。以亚硫酸盐溶液为氧化剂,铜为电触点,接触电阻率为0.16 /spl ω /cm/sup 2/。采用x射线衍射(XRD)和原子发射光谱(AES)研究了不同表面处理对cdte表面形貌的影响。
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