Sensitivity analysis for nanostructure metrology by Mueller matrix polarimetry

Abstract

This paper presents the modeling and simulation of Mueller matrix polarimetry for nanostructure metrology, with an emphasis on the sensitivity analysis. Taking a two-dimensional grating as an example, the modeling method using the rigorous coupled-wave analysis theory has been described. The Mueller matrix elements are obtained with different measurement configurations, such as changing the wavelength and azimuthal angle. It is observed that different geometrical parameters show variable sensitivities even under a fixed measurement configuration, and more information is achievable by changing the configuration. It is thus verified that it is feasible and effective to characterize nanostructures by the Mueller matrix polarimetry.