F. Hapke, R. Arnold, Matthias Beck, M. Baby, S. Straehle, J. Gonçalves, A. Panait, R. Behr, Gwenolé Maugard, A. Prashanthi, J. Schlöffel, W. Redemund, Andreas Glowatz, A. Fast, J. Rajski
{"title":"Cell-aware experiences in a high-quality automotive test suite","authors":"F. Hapke, R. Arnold, Matthias Beck, M. Baby, S. Straehle, J. Gonçalves, A. Panait, R. Behr, Gwenolé Maugard, A. Prashanthi, J. Schlöffel, W. Redemund, Andreas Glowatz, A. Fast, J. Rajski","doi":"10.1109/ETS.2014.6847814","DOIUrl":null,"url":null,"abstract":"High quality is an absolute necessity for automotive designs. This paper describes an approach to improve the overall defect coverage for CMOS-based high quality automotive designs. We present results from a cell-aware (CA) characterization flow for 216 cells, the pattern generation flow for a 130nm smart power design, and high-volume production test results achieved after testing multimillion parts. The idea behind CA tests is to detect cell-internal (CI) bridges, opens, leaking and high resistive transistor defects which are undetected with state-of-the-art tests. The production test results have shown that the CA tests detect various failing parts during a first wafer sort test which still resulted into unique failing parts after a second wafer sort test done at a different temperature and with additional tests. The obtained results encouraged us to continue this work beyond this paper to run further experiments with the final goal to eliminate the stuck-at (SA) and transition delay (TR) test by simultaneously improving the quality with CA tests which are a superset of SA and TR tests.","PeriodicalId":145416,"journal":{"name":"2014 19th IEEE European Test Symposium (ETS)","volume":"12 4","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-05-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"19","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 19th IEEE European Test Symposium (ETS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ETS.2014.6847814","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 19
Abstract
High quality is an absolute necessity for automotive designs. This paper describes an approach to improve the overall defect coverage for CMOS-based high quality automotive designs. We present results from a cell-aware (CA) characterization flow for 216 cells, the pattern generation flow for a 130nm smart power design, and high-volume production test results achieved after testing multimillion parts. The idea behind CA tests is to detect cell-internal (CI) bridges, opens, leaking and high resistive transistor defects which are undetected with state-of-the-art tests. The production test results have shown that the CA tests detect various failing parts during a first wafer sort test which still resulted into unique failing parts after a second wafer sort test done at a different temperature and with additional tests. The obtained results encouraged us to continue this work beyond this paper to run further experiments with the final goal to eliminate the stuck-at (SA) and transition delay (TR) test by simultaneously improving the quality with CA tests which are a superset of SA and TR tests.