{"title":"A machine learning based approach to manufacturing process planning","authors":"L. Horváth, I. Rudas","doi":"10.1109/ISIE.1993.268767","DOIUrl":null,"url":null,"abstract":"This paper presents a new approach to introducing machine learning techniques to solve a few problems encountered in the recent CAPP systems when they applied in company practice. It shows a process planning methodology which enables application of practically applicable learning algorithms. The authors suggest four levels of learning corresponding to the four levels of process planning knowledge defined.<<ETX>>","PeriodicalId":267349,"journal":{"name":"ISIE '93 - Budapest: IEEE International Symposium on Industrial Electronics Conference Proceedings","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ISIE '93 - Budapest: IEEE International Symposium on Industrial Electronics Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISIE.1993.268767","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
This paper presents a new approach to introducing machine learning techniques to solve a few problems encountered in the recent CAPP systems when they applied in company practice. It shows a process planning methodology which enables application of practically applicable learning algorithms. The authors suggest four levels of learning corresponding to the four levels of process planning knowledge defined.<>