Far-Field Nanostructuring in Dielectric Materials Beyond the Diffraction Limit Using Femtosecond Laser (「レーザーナノ加工技術の進展」特集号)

Abstract

progress in the development of far- fi eld nanostructuring technologies based on femtosecond laser direct writing. The principles for breaking through the diffraction limit in the interaction of a focused ultrafast laser beam with dielectric materials are presented, and applications of the femtosecond laser nanostructuring are discussed.