32 x 16 CMOS smart pixel array for optical interconnects

Jongwoo Kim, P. Guilfoyle, R. V. Stone, J. Hessenbruch, K. Choquette, F. Kiamilev
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引用次数: 2

Abstract

Free space optical interconnects can increase throughput capacities and eliminate much of the energy consumption required for `all electronic' systems. High speed optical interconnects can be achieved by integrating optoelectronic devices with conventional electronics. Smart pixel arrays have been developed which use optical interconnects. An individual smart pixel cell is composed of a vertical cavity surface emitting laser (VCSEL), a photodetector, an optical receiver, a laser driver, and digital logic circuitry. Oxide-confined VCSELs are being developed to operate at 850 nm with a threshold current of approximately 1 mA. Multiple quantum well photodetectors are being fabricated from AlGaAs for use with the 850 nm VCSELs. The VCSELs and photodetectors are being integrated with complementary metal oxide semiconductor (CMOS) circuitry using flip-chip bonding. CMOS circuitry is being integrated with a 32 X 16 smart pixel array. The 512 smart pixels are serially linked. Thus, an entire data stream may be clocked through the chip and output electrically by the last pixel. Electrical testing is being performed on the CMOS smart pixel array. Using an on-chip pseudo random number generator, a digital data sequence was cycled through the chip verifying operation of the digital circuitry. Although, the prototype chip was fabricated in 1.2 micrometers technology, simulations have demonstrated that the array can operate at 1 Gb/s per pixel using 0.5 micrometers technology.
32 × 16 CMOS智能像素阵列,用于光互连
自由空间光互连可以增加吞吐量,并消除“全电子”系统所需的大部分能源消耗。通过将光电器件与传统电子器件集成,可以实现高速光互连。采用光互连技术的智能像素阵列已经被开发出来。单个智能像素单元由垂直腔面发射激光器(VCSEL)、光电探测器、光接收器、激光驱动器和数字逻辑电路组成。氧化物受限vcsel正在开发中,其工作波长为850纳米,阈值电流约为1 mA。用AlGaAs制备了多个量子阱光电探测器,用于850 nm vcsel。vcsel和光电探测器正通过倒装键合与互补金属氧化物半导体(CMOS)电路集成。CMOS电路与32 X 16智能像素阵列集成。512个智能像素是串联的。因此,整个数据流可以通过芯片进行时钟处理,并通过最后一个像素电输出。正在对CMOS智能像素阵列进行电气测试。利用片上伪随机数发生器,循环一个数字数据序列,通过芯片验证数字电路的操作。虽然原型芯片是用1.2微米技术制造的,但模拟表明,该阵列可以使用0.5微米技术以每像素1gb /s的速度运行。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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