Suppression of ion emission and pinching using heated tantalum anodes in high-power electron-beam diodes

B. Weber, S. Stephanakis, D. Black, G. Cooperstein, N. Pereira
{"title":"Suppression of ion emission and pinching using heated tantalum anodes in high-power electron-beam diodes","authors":"B. Weber, S. Stephanakis, D. Black, G. Cooperstein, N. Pereira","doi":"10.1109/PLASMA.2000.854835","DOIUrl":null,"url":null,"abstract":"Pulse-heating tantalum anodes to > 2200 K results in drastic changes to ion emission and beam dynamics. The ion current starts later, the peak ion current is reduced, and beam pinching is suppressed or eliminated. The diode current follows a single-species Child-Langmuir formula until the voltage exceeds 1 MV, then follows a critical current formula, indicating that ions have little effect on the diode impedance. The experiments indicate a definite dependence on different heating procedures. This technique can be used to improved x-ray production on high-power generators such as Decade.","PeriodicalId":101591,"journal":{"name":"2000 13th International Conference on High-Power Particle Beams","volume":"93 10","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 13th International Conference on High-Power Particle Beams","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PLASMA.2000.854835","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Pulse-heating tantalum anodes to > 2200 K results in drastic changes to ion emission and beam dynamics. The ion current starts later, the peak ion current is reduced, and beam pinching is suppressed or eliminated. The diode current follows a single-species Child-Langmuir formula until the voltage exceeds 1 MV, then follows a critical current formula, indicating that ions have little effect on the diode impedance. The experiments indicate a definite dependence on different heating procedures. This technique can be used to improved x-ray production on high-power generators such as Decade.
在高功率电子束二极管中使用加热钽阳极抑制离子发射和挤压
脉冲加热钽阳极至> 2200k会导致离子发射和光束动力学的剧烈变化。离子电流开始较晚,峰值离子电流降低,抑制或消除束缩现象。在电压超过1 MV之前,二极管电流遵循单种Child-Langmuir公式,然后遵循临界电流公式,表明离子对二极管阻抗的影响很小。实验表明,不同的加热程序对其有一定的依赖性。该技术可用于提高高功率发生器(如Decade)的x射线产量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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