A 28nm high density 1R/1W 8T-SRAM macro with screening circuitry against read disturb failure

M. Yabuuchi, H. Fujiwara, Y. Tsukamoto, Miki Tanaka, S. Tanaka, K. Nii
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引用次数: 10

Abstract

We developed a high density 1R/1W SRAM macro based on 8T-SRAM with an effective scheme for Design for Testability. To achieve a smaller Macro area, a differential sense amplifier is introduced to read the data, where the reference voltage for reading 0/1 data is generated by unselected cell array. In addition, we proposed a screening test circuit for read disturb operation. A 512 kbit two port SRAM macro based upon 28nm process was designed, confirming experimentally that the worst minimum operation voltage (Vmin) can be reproduced by our test circuit. The bit density of 3.16 Mb/mm2 was achieved, which is the highest among recent literatures.
一种28nm高密度1R/1W 8T-SRAM宏,具有防止读取干扰故障的筛选电路
我们在8T-SRAM的基础上开发了一个高密度1R/1W SRAM宏,并提供了一个有效的可测试性设计方案。为了实现更小的宏面积,引入差分感测放大器来读取数据,其中读取0/1数据的参考电压由未选择的单元阵列产生。此外,我们还提出了一种读干扰操作的筛选试验电路。设计了一个基于28nm工艺的512 kbit双端口SRAM宏,实验验证了该测试电路可以再现最小工作电压(Vmin)。实现了3.16 Mb/mm2的比特密度,是目前文献中最高的。
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