{"title":"Challenges for sub-10 nm CMOS devices","authors":"T. Mogami, H. Wakabayashi","doi":"10.1109/IWNC.2006.4570982","DOIUrl":null,"url":null,"abstract":"Scaling issues of nano-size MOSFETs will be discussed on the basis of sub-10 nm MOSFETs characteristics, which have been developed and confirmed switching characteristics. Understanding device limitations and developing new breakthrough technologies should be required to challenge sub-10-nm CMOS devices.","PeriodicalId":356139,"journal":{"name":"2006 International Workshop on Nano CMOS","volume":"77 5‐6","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 International Workshop on Nano CMOS","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWNC.2006.4570982","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8
Abstract
Scaling issues of nano-size MOSFETs will be discussed on the basis of sub-10 nm MOSFETs characteristics, which have been developed and confirmed switching characteristics. Understanding device limitations and developing new breakthrough technologies should be required to challenge sub-10-nm CMOS devices.