A reliability study of titanium silicide lines using micro-Raman spectroscopy and emission microscopy

Abstract

Micro-Raman spectroscopy and emission microscopy are used to study the crystallographic phase of 0.25 /spl mu/m wide TiSi/sub 2/ lines. It is shown that these techniques allow nondestructive mapping of the local phase of TiSi/sub 2/. The results show that there is a direct correlation between the resistance variation of these lines and the local occurrence of the high resistivity C49 phase of TiSi/sub 2/ in the lines.