Speed Improvement in SRAM Cell Using Transmission Gates

P. Swetha, P. Meghana, Jonnala Charisma, Kirti S. Pande
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引用次数: 3

Abstract

All battery-operated devices require primary memory that responds fast. By virtue of its high speed and performance, Static RAM is commonly used as cache memory and main memory in many applications. A major challenge faced in design of SRAM Cells is Read Destruction. This work introduces Transmission Gate Differential 8T (TGD8T) SRAM Cell, in which Transmission Gates are used instead of Pass Transistors in feedback path of the Existing D8T SRAM Cell in order to minimize the voltage drop across the Pass Transistors. This reduces the amount of Read Destruction and accelerates the data transmission. The transmission gates have been implemented using both High Threshold Voltage (HVT) and Low Threshold Voltage (LVT) type MOSFETS. The amount of Read Destruction in TGD8T SRAM Cell is 66.59% lesser than that of the Existing D8T SRAM Cell. Further, the transient analysis of the Read Destruction in the proposed design shows a 29.45 % reduction in the Average Transient Time. The TGD8T SRAM Cell using LVT type MOSFETs offers lesser rise time and a lower voltage drop during data transmission over the model using HVT type MOSFETs. Analysis of Static Noise Margin (SNM) of the proposed cell using N-Curve Method shows 0.13% and 5% increase in current and voltage SNMs respectively showing no compromise in noise immunity when compared to the Existing D8T SRAM Cell. The proposed TGD8T SRAM Cell is implemented in Cadence Virtuoso using gpdk 45 nm technology at a supply voltage of 0.5 V.
利用传输门提高SRAM单元的速度
所有电池供电的设备都需要快速响应的主存储器。静态RAM由于其高速和高性能,在许多应用中常用作高速缓存和主存。SRAM单元设计面临的一个主要挑战是读破坏。本文介绍了传输门差分8T (TGD8T) SRAM单元,其中在现有D8T SRAM单元的反馈路径中使用传输门代替通路晶体管,以最小化通路晶体管上的电压降。这样可以减少读破坏的数量,提高数据传输速度。传输门已经使用高阈值电压(HVT)和低阈值电压(LVT)型mosfet实现。TGD8T SRAM Cell的读破坏量比现有的D8T SRAM Cell减少了66.59%。此外,对所提出设计的读破坏的瞬态分析表明,平均瞬态时间减少了29.45%。使用LVT型mosfet的TGD8T SRAM单元在使用HVT型mosfet的模型上进行数据传输时提供更短的上升时间和更低的电压降。利用n曲线法分析该电池的静态噪声裕度(SNM),结果表明,与现有的D8T SRAM电池相比,电流和电压的SNM分别提高了0.13%和5%,且抗噪能力没有降低。提出的TGD8T SRAM Cell在Cadence Virtuoso中使用gpdk 45 nm技术在0.5 V的电源电压下实现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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