{"title":"New Functions Elaborated in Oxide Glasses by Nanotechnology","authors":"J. Nishii, K. Hirao","doi":"10.1109/ICMENS.2004.114","DOIUrl":null,"url":null,"abstract":"Recent three topics of Nanotechnology Glass Project were described. (1) A proton-conducting hybrid material was fabricated using a glass plate with nano-pores. The conductivity of the hybrid glass plate was comparable to Nafion, and no corrosion or degradation observed up to 120°C. (2) Nano-particles of CdTe were synthesized in a water solution and embedded in the glass matrix using a sol-gel method. The emission quantum efficiency pf 3% was attained. (3) Deep dry etching followed by overcladding buried the DOE with a deep groove inside a Si0₂ plate, which was used for fabrication of an ultra small demultiplexer.","PeriodicalId":344661,"journal":{"name":"2004 International Conference on MEMS, NANO and Smart Systems (ICMENS'04)","volume":"52 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-08-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 International Conference on MEMS, NANO and Smart Systems (ICMENS'04)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMENS.2004.114","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Recent three topics of Nanotechnology Glass Project were described. (1) A proton-conducting hybrid material was fabricated using a glass plate with nano-pores. The conductivity of the hybrid glass plate was comparable to Nafion, and no corrosion or degradation observed up to 120°C. (2) Nano-particles of CdTe were synthesized in a water solution and embedded in the glass matrix using a sol-gel method. The emission quantum efficiency pf 3% was attained. (3) Deep dry etching followed by overcladding buried the DOE with a deep groove inside a Si0₂ plate, which was used for fabrication of an ultra small demultiplexer.