Dielectric Relaxation and Photo-electromotive Force in Ge-Sb-Te/Si Structures

R. A. Castro-Arata, M. Goryaev, A. Kononov, Y. Saito, P. Fons, J. Tominaga, N. Anisimova, A. Kolobov
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Abstract

The dielectric properties and photovoltaic effect spectra in the compositions of amorphous layers GeSb2Te4 (GST 124), Ge2Sb2Te5 (GST 225) и GeSb4Te7 (GST 147) applied on the monocrystallic silicon surface are investigated. It is shown that with a change in the GST composition, both the dielectric capacitivity and the frequency at which the maximum dielectric loss is observed change. It was found that the value of the change in photo-electromotive force is different for different layers: on samples with GST 124, the influence of amorphous layers is by an order of magnitude greater than for GST 225, and by 3 orders of magnitude greater than for GST 147.
Ge-Sb-Te/Si结构中的介电弛豫和光电动势
研究了应用于单晶硅表面的GeSb2Te4 (GST 124)、Ge2Sb2Te5 (GST 225)和GeSb4Te7 (GST 147)非晶层的介电性能和光伏效应光谱。结果表明,随着GST成分的变化,介质电容和最大介质损耗的频率都发生了变化。发现不同层的光电动势变化的值是不同的:在具有GST 124的样品上,非晶层的影响比GST 225大一个数量级,比GST 147大3个数量级。
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