{"title":"Laser-plasma sources for lithography","authors":"J. Forsyth","doi":"10.1364/swcr.1991.wb3","DOIUrl":null,"url":null,"abstract":"The characteristics of laser-plasma sources for lithographic applications in different spectral ranges will be reviewed, and the performance potential will be summarized.","PeriodicalId":286766,"journal":{"name":"Short-Wavelength Coherent Radiation: Generation and Application","volume":"247 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Short-Wavelength Coherent Radiation: Generation and Application","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/swcr.1991.wb3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The characteristics of laser-plasma sources for lithographic applications in different spectral ranges will be reviewed, and the performance potential will be summarized.