Reactively Sputtered Zn(O,S) Buffer Layer Suitable for Roll-to-Roll Fabrication of Cu(In,Ga)Se2 Devices

Graeme Housser, H. Efstathiadis
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Abstract

One promising pathway to lower the dollar-per-watt ($/W) cost of CIGS PV is by transitioning the entire device fabrication process to high-throughput roll-to-roll (R2R) or sheet-to-sheet manufacturing. For the full realization of this goal, it is essential that each layer and process in the CIGS stack be optimized for throughput, uniformity, and low-cost operation and maintenance. In this work, Zn(O,S) films are deposited by RF reactive magnetron sputtering for evaluation as an R2R-suitable alternative buffer layer and compared to the industry standard CdS buffer layer deposited by chemical bath. ZnOS films are grown under a range of conditions and characterized by AES, UV-Vis, and XRD. A set of 35 10 cm × 10 cm 3-stage co-evaporated CIGS layers were grown on Mo coated soda lime glass (SLG) and split in half, with one half receiving a sputtered Zn(O,S) buffer layer, and the other half a baseline CdS deposited by chemical bath and a sputtered intrinsic ZnO (i-ZnO) bilayer. The devices were completed with Al:ZnO and Ni/Al grids, with no antireflective coating, then mechanically scribed to isolate 0.43 cm2 area sized cells. Analysis of the completed devices includes IV testing under simulated AM1.5 irradiance. Shunt resistance and series resistance are approximated based on IV curve data. The highest efficiency Zn(O,S) based device measured 10.0% while its control pair measured 12.8% with a CdS/i-ZnO bilayer.
适用于卷对卷制备Cu(In,Ga)Se2器件的反应溅射Zn(O,S)缓冲层
降低CIGS PV每瓦成本($/W)的一个有希望的途径是将整个器件制造过程过渡到高通量卷对卷(R2R)或片对片制造。为了充分实现这一目标,必须优化CIGS堆栈中的每一层和工艺,以实现吞吐量、均匀性和低成本的操作和维护。本文采用射频反应磁控溅射法制备Zn(O,S)薄膜,并与工业标准的化学镀液法制备的CdS缓冲层进行了比较。采用AES、UV-Vis和XRD对zno薄膜进行了表征。在Mo涂层的钠石灰玻璃(SLG)上生长了一组35个10 cm × 10 cm的三段式共蒸发CIGS层,并将其分成两半,其中一半是溅射Zn(O,S)缓冲层,另一半是化学浴沉积的基准CdS和溅射本质ZnO (i-ZnO)双分子层。该器件由Al:ZnO和Ni/Al栅格完成,没有抗反射涂层,然后机械刻蚀以隔离0.43 cm2面积大小的电池。完成的器件分析包括模拟AM1.5辐照度下的IV测试。并联电阻和串联电阻根据IV曲线数据进行近似。在CdS/i-ZnO双分子层中,Zn(O,S)基器件的最高效率为10.0%,而其控制对的最高效率为12.8%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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