RF-MEMS-platform based on silicon-ceramic-composite-substrates

M. Fischer, S. Gropp, J. Nowak, R. Sommer, M. Hoffmann, J. Muller
{"title":"RF-MEMS-platform based on silicon-ceramic-composite-substrates","authors":"M. Fischer, S. Gropp, J. Nowak, R. Sommer, M. Hoffmann, J. Muller","doi":"10.1109/GEMIC.2015.7107837","DOIUrl":null,"url":null,"abstract":"In the last few years, several Low Temperature Co-fired Ceramics (LTCC) materials with a silicon adapted Coefficient of Thermal Expansion (CTE) have been developed for direct wafer bonding to silicon. BGK (special type designation of Fraunhofer IKTS), a sodium containing LTCC was originally developed for anodic bonding of the sintered LTCC whereas BCT (Bondable Ceramic Tape) tailored for direct silicon bonding of green LTCC tapes to fabricate a quasi-monolithic silicon ceramic compound substrate. This so-called SiCer technique is based on homogeneous nano-structuring of a silicon substrate, a lamination step of BCT and silicon and a subsequent pressure assisted sintering. We present a new approach for an integrated RF-platform-setup combining passive, active and mechanical elements on one SiCer substrate. In this context RF parameters of the silicon adapted LTCC tapes are investigated. We show first technological results of creating cavities at the silicon ceramic interface for SiCer-specific contacting options as well as windows in the ceramic layer of the SiCer substrate for additional silicon processing. A further investigated platform technology is deep reactive ion etching of the silicon-ceramic-composite-substrate. The etching behavior of silicon on BCT will be demonstrated and discussed. With the SiCer technique it is possible to reduce the silicon content at the setup of RF MEMS to a minimum (low signal damping).","PeriodicalId":229585,"journal":{"name":"2015 German Microwave Conference","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 German Microwave Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GEMIC.2015.7107837","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9

Abstract

In the last few years, several Low Temperature Co-fired Ceramics (LTCC) materials with a silicon adapted Coefficient of Thermal Expansion (CTE) have been developed for direct wafer bonding to silicon. BGK (special type designation of Fraunhofer IKTS), a sodium containing LTCC was originally developed for anodic bonding of the sintered LTCC whereas BCT (Bondable Ceramic Tape) tailored for direct silicon bonding of green LTCC tapes to fabricate a quasi-monolithic silicon ceramic compound substrate. This so-called SiCer technique is based on homogeneous nano-structuring of a silicon substrate, a lamination step of BCT and silicon and a subsequent pressure assisted sintering. We present a new approach for an integrated RF-platform-setup combining passive, active and mechanical elements on one SiCer substrate. In this context RF parameters of the silicon adapted LTCC tapes are investigated. We show first technological results of creating cavities at the silicon ceramic interface for SiCer-specific contacting options as well as windows in the ceramic layer of the SiCer substrate for additional silicon processing. A further investigated platform technology is deep reactive ion etching of the silicon-ceramic-composite-substrate. The etching behavior of silicon on BCT will be demonstrated and discussed. With the SiCer technique it is possible to reduce the silicon content at the setup of RF MEMS to a minimum (low signal damping).
基于硅-陶瓷-复合衬底的rf - mems平台
在过去的几年里,已经开发了几种具有硅适应热膨胀系数(CTE)的低温共烧陶瓷(LTCC)材料,用于直接与硅晶圆键合。BGK (Fraunhofer IKTS的特殊类型名称)是一种含钠的LTCC,最初是为烧结LTCC的阳极键合而开发的,而BCT(可粘结陶瓷带)是为绿色LTCC带的直接硅键合而定制的,用于制造准单片硅陶瓷化合物衬底。这种所谓的SiCer技术是基于硅衬底的均匀纳米结构,BCT和硅的层压步骤以及随后的压力辅助烧结。我们提出了一种在硅基板上结合无源、有源和机械元件的集成射频平台设置的新方法。在这种情况下,研究了硅适应LTCC带的射频参数。我们展示了在硅陶瓷界面上为SiCer特定接触选项创建空腔的第一个技术成果,以及在SiCer衬底的陶瓷层中为额外的硅加工创建窗口。进一步研究的平台技术是硅-陶瓷-复合衬底的深度反应离子刻蚀。我们将演示和讨论硅在BCT上的蚀刻行为。使用SiCer技术,可以将RF MEMS设置时的硅含量降低到最低(低信号阻尼)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信