P.W. von Basse, D.G. Edwards, D. Essl, R. Hofmann, R. Losehand
{"title":"Realization of a 65K dynamic RAM device making exclusive use of VMOS transistors","authors":"P.W. von Basse, D.G. Edwards, D. Essl, R. Hofmann, R. Losehand","doi":"10.1109/IEDM.1977.189328","DOIUrl":null,"url":null,"abstract":"A VMOS RAM, implemented without planar transistors requires only 6 mask steps instead of 7 and offers more options in process optimization, for example in the selection of the doping concentrations.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"192 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1977 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1977.189328","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
A VMOS RAM, implemented without planar transistors requires only 6 mask steps instead of 7 and offers more options in process optimization, for example in the selection of the doping concentrations.