65nm Omnibudsman

T. Vucurevich
{"title":"65nm Omnibudsman","authors":"T. Vucurevich","doi":"10.1109/ICVD.2005.5","DOIUrl":null,"url":null,"abstract":"Summary form only given. Just as the semiconductor industry has begun to ship production products at 90nm we find ourselves starting \"pipe cleaner\" designs at 65nm. Each process generation provides both opportunities and challenges to design teams and the 65nm node is no exception. This paper provides a short overview of the challenges of designing at 65nm with special emphasis on the relationship of the design process to the manufacturing process and what is changing in the way that design tools keep complexity at bay in a world where power density and process variability threaten to drive us off of Moore's now famous law.","PeriodicalId":382435,"journal":{"name":"VLSI design (Print)","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-01-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"VLSI design (Print)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICVD.2005.5","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Summary form only given. Just as the semiconductor industry has begun to ship production products at 90nm we find ourselves starting "pipe cleaner" designs at 65nm. Each process generation provides both opportunities and challenges to design teams and the 65nm node is no exception. This paper provides a short overview of the challenges of designing at 65nm with special emphasis on the relationship of the design process to the manufacturing process and what is changing in the way that design tools keep complexity at bay in a world where power density and process variability threaten to drive us off of Moore's now famous law.
65海里Omnibudsman
只提供摘要形式。就在半导体行业开始生产90纳米的产品时,我们发现自己开始采用65纳米的“管道清洁器”设计。每一代工艺都为设计团队提供了机遇和挑战,65nm节点也不例外。本文简要概述了65纳米设计的挑战,特别强调了设计过程与制造过程的关系,以及在功率密度和工艺可变性威胁着我们脱离著名的摩尔定律的世界中,设计工具保持复杂性的方式正在发生什么变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信