{"title":"Proposal of new style defect quality assurance for flat panel display photomask","authors":"Shinya Hamasuna, Taichi Ozaki, Kenichi Kanaya","doi":"10.1117/12.2598157","DOIUrl":null,"url":null,"abstract":"Since the mid-2010s, mobile organic light emitting diode (OLED) panels have increased the demand for increased resolution in Flat Panel Display (FPD) photomasks [1]. In response to this demand, a 1.5 um Line and Space target exposure system for 800ppi OLED panels ware released in the mid-2010s. In addition, exposure system manufacturers are developing 1.2um Line and Space target exposure systems to produce ultra-high-definition OLEDs in the 800-1000ppi range [2]. While photomask manufacturers are required to have defect assurance capabilities for the next generation design, there is no standard industry roadmap in the field of FPD lithography. We believe that what is really necessary for the OLED panels manufacturer is to ensure that the pattern on the photomask is transferred to the OLED panel without any problems. Instead of the assurance based on the size of the defect on the photomask, we propose a new type of photomask assurance, which is the assurance for the pattern transfer to the OLED panel by the photomask maker. In this report, we will report on our new type FPD photomask assurance proposal.","PeriodicalId":138407,"journal":{"name":"Photomask Japan","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2021-08-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photomask Japan","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2598157","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Since the mid-2010s, mobile organic light emitting diode (OLED) panels have increased the demand for increased resolution in Flat Panel Display (FPD) photomasks [1]. In response to this demand, a 1.5 um Line and Space target exposure system for 800ppi OLED panels ware released in the mid-2010s. In addition, exposure system manufacturers are developing 1.2um Line and Space target exposure systems to produce ultra-high-definition OLEDs in the 800-1000ppi range [2]. While photomask manufacturers are required to have defect assurance capabilities for the next generation design, there is no standard industry roadmap in the field of FPD lithography. We believe that what is really necessary for the OLED panels manufacturer is to ensure that the pattern on the photomask is transferred to the OLED panel without any problems. Instead of the assurance based on the size of the defect on the photomask, we propose a new type of photomask assurance, which is the assurance for the pattern transfer to the OLED panel by the photomask maker. In this report, we will report on our new type FPD photomask assurance proposal.
自2010年代中期以来,移动有机发光二极管(OLED)面板增加了对平板显示器(FPD)掩膜[1]分辨率的需求。为了满足这一需求,在2010年代中期,针对800ppi OLED面板推出了1.5 um Line and Space目标曝光系统。此外,曝光系统制造商正在开发1.2um Line和Space目标曝光系统,以生产800-1000ppi范围内的超高清oled。虽然光掩模制造商被要求具有下一代设计的缺陷保证能力,但在FPD光刻领域没有标准的行业路线图。我们认为,对于OLED面板制造商来说,真正必要的是确保光掩膜上的图案毫无问题地转移到OLED面板上。我们提出了一种新型的光掩膜保证,即光掩膜制造商将图案转移到OLED面板上的保证,而不是基于光掩膜缺陷大小的保证。在本报告中,我们将报告我们的新型FPD光掩膜保证方案。