An ESD transient clamp with 494 pA leakage current in GP 65 nm CMOS technology

M. Elghazali, M. Sachdev, A. Opal
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Abstract

In this paper, a low-leakage PMOS based transient clamp with a thyristor as a delay element in 65 nm general-purpose (GP) CMOS technology is presented. Simulation results show that the proposed clamp is capable of protecting the circuit core against ±1.5 kV HBM and ±125 V CDM ESD stress by limiting the voltage across it to less than 5 V. The proposed clamp was characterized over PVT conditions with 2200 different combinations to investigate the selectivity to power-on ramp rates. Extensive analysis and measurements demonstrate that the clamp is robust against false triggering and transient induced latch-up. Measurement results show that the clamp is capable of handling 3.82 A, while its leakage is only 494 pA at room temperature. HBM and CDM measurement results show that the proposed clamp passed +3.25 kV and −1.75 kV HBM stresses and +800 V and −550 V CDM stresses.
GP 65nm CMOS技术中漏电流为494 pA的ESD瞬态箝位
本文提出了一种以可控硅作为延迟元件的低漏PMOS暂态箝位电路,采用65nm通用CMOS技术。仿真结果表明,所提出的箝位能够通过将其上的电压限制在5 V以下来保护电路铁芯免受±1.5 kV HBM和±125 V CDM ESD应力的影响。该夹具在2200种不同组合的PVT条件下进行了表征,以研究其对上电斜坡速率的选择性。广泛的分析和测量表明,该夹具具有抗误触发和瞬态诱发闭锁的鲁棒性。测量结果表明,该钳能够处理3.82 A,而其漏电流在室温下仅为494 pA。HBM和CDM测量结果表明,所提出的箝位可以通过+3.25 kV和- 1.75 kV HBM应力和+800 V和- 550 V CDM应力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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