A. M. N. Al-Mobin, R. Shankar, W. Cross, J. Kellar, K. Whites, D. Anagnostou
{"title":"Advances in direct-write printing of RF-MEMS using M3D","authors":"A. M. N. Al-Mobin, R. Shankar, W. Cross, J. Kellar, K. Whites, D. Anagnostou","doi":"10.1109/MWSYM.2014.6848652","DOIUrl":null,"url":null,"abstract":"We report an additive manufacturing process using in-house custom-made inks for the fabrication of ohmic contact RF MEMS switches. The fabrication involves multiple steps of additive printing using a conductive silver ink and a PMMA [poly(methyl methacrylate)] photoresistive polymer ink. The inks comply with the rheology requirements of the M3D material deposition system. Deposition is made at 40°C and feature sizes involve 10-20μm. The maximum temperature of the process depends on ink curing and was 250°C. A functional ohmic contact cantilever RF MEMS switch on flexible Kapton™ substrate was fabricated and tested successfully, and results are presented.","PeriodicalId":262816,"journal":{"name":"2014 IEEE MTT-S International Microwave Symposium (IMS2014)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE MTT-S International Microwave Symposium (IMS2014)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSYM.2014.6848652","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10
Abstract
We report an additive manufacturing process using in-house custom-made inks for the fabrication of ohmic contact RF MEMS switches. The fabrication involves multiple steps of additive printing using a conductive silver ink and a PMMA [poly(methyl methacrylate)] photoresistive polymer ink. The inks comply with the rheology requirements of the M3D material deposition system. Deposition is made at 40°C and feature sizes involve 10-20μm. The maximum temperature of the process depends on ink curing and was 250°C. A functional ohmic contact cantilever RF MEMS switch on flexible Kapton™ substrate was fabricated and tested successfully, and results are presented.