70nm NAND flash technology with 0.025 /spl mu/m/sup 2/ cell size for 4Gb flash memory

Y. Yim, Kwang-Shik Shin, S. Hur, Jaeduk Lee, Ihn-Gee Balk, H. Kim, Soo-Jin Chai, Eunkyeong Choi, Mincheol Park, D. Eun, Sungyeon Lee, Hye-Jin Lim, S. Youn, Sungyeon Lee, Tae-Jung Kim, Hansoo Kim, Kyucharn Park, Ki-Nam Kim
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引用次数: 9

Abstract

A 4 Gb NAND flash memory with a 70 nm design rule is developed for mass storage applications. The cell size is 0.025 /spl mu/m/sup 2/, which is the smallest value ever reported. For the integration, an ArF lithography process along with resolution enhancing techniques was utilized, and poly-Si/W gate technology with an optimized re-oxidation process was implemented.
70nm NAND闪存技术,容量为0.025 /spl mu/m/sup 2/ cell,适用于4Gb闪存
针对大容量存储应用,开发了一种采用70nm设计规则的4gb NAND闪存。细胞大小为0.025 /spl mu/m/sup 2/,这是所报道的最小值。为了集成,利用了ArF光刻工艺和分辨率增强技术,并实现了优化的再氧化工艺的多晶硅/钨栅极技术。
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