Software-enabled design visibility enhancement for failure analysis process improvement

Chia-Chih Yen, Shen-Tien Lin, Kai Yang, Jerome Peillat, Paul Gibson, E. Auvray
{"title":"Software-enabled design visibility enhancement for failure analysis process improvement","authors":"Chia-Chih Yen, Shen-Tien Lin, Kai Yang, Jerome Peillat, Paul Gibson, E. Auvray","doi":"10.1109/VDAT.2009.5158126","DOIUrl":null,"url":null,"abstract":"Traditional failure analysis (FA) process proceeds by investigating the tester results of several suspected silicon signals, and then applying CAD tools to navigate and compare pre-silicon design behaviors. However, existing CAD tools usually lack of design visibility due to the imperfect link between test and design environments. In this paper, we introduce a series of design visibility enhancement tools to augment FA process flow. These tools not only feature design comprehension and logic tracing capability, but also expand and correlate silicon data to design functionality. With the seamless visibility enhancement environment, we show the FA process can be performed more efficiently.","PeriodicalId":246670,"journal":{"name":"2009 International Symposium on VLSI Design, Automation and Test","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-04-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 International Symposium on VLSI Design, Automation and Test","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VDAT.2009.5158126","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Traditional failure analysis (FA) process proceeds by investigating the tester results of several suspected silicon signals, and then applying CAD tools to navigate and compare pre-silicon design behaviors. However, existing CAD tools usually lack of design visibility due to the imperfect link between test and design environments. In this paper, we introduce a series of design visibility enhancement tools to augment FA process flow. These tools not only feature design comprehension and logic tracing capability, but also expand and correlate silicon data to design functionality. With the seamless visibility enhancement environment, we show the FA process can be performed more efficiently.
软件支持的设计可见性增强,用于故障分析过程改进
传统的失效分析(FA)过程是通过调查几个可疑的硅信号的测试结果,然后应用CAD工具来导航和比较硅之前的设计行为。然而,由于测试和设计环境之间的联系不完善,现有的CAD工具通常缺乏设计可见性。在本文中,我们介绍了一系列的设计可见性增强工具来增强FA流程。这些工具不仅具有设计理解和逻辑跟踪能力,而且还扩展和关联硅数据到设计功能。通过无缝可见性增强环境,我们可以更有效地执行FA过程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信