J. Pekarik, J. Adkisson, P. Gray, Q. Liu, R. Camillo-Castillo, M. Khater, V. Jain, B. Zetterlund, A. DiVergilio, X. Tian, A. Vallett, J. Ellis-Monaghan, B. J. Gross, P. Cheng, V. Kaushal, Z. He, J. Lukaitis, K. Newton, M. Kerbaugh, N. Cahoon, L. Vera, Y. Zhao, J. Long, A. Valdes-Garcia, S. Reynolds, W. Lee, B. Sadhu, D. Harame
{"title":"A 90nm SiGe BiCMOS technology for mm-wave and high-performance analog applications","authors":"J. Pekarik, J. Adkisson, P. Gray, Q. Liu, R. Camillo-Castillo, M. Khater, V. Jain, B. Zetterlund, A. DiVergilio, X. Tian, A. Vallett, J. Ellis-Monaghan, B. J. Gross, P. Cheng, V. Kaushal, Z. He, J. Lukaitis, K. Newton, M. Kerbaugh, N. Cahoon, L. Vera, Y. Zhao, J. Long, A. Valdes-Garcia, S. Reynolds, W. Lee, B. Sadhu, D. Harame","doi":"10.1109/BCTM.2014.6981293","DOIUrl":null,"url":null,"abstract":"We present the electrical characteristics of the first 90nm SiGe BiCMOS technology developed for production in IBM's large volume 200mm fabrication line. The technology features 300 GHz fT and 360 GHz fMAX high performance SiGe HBTs, 135 GHz fT and 2.5V BVCEO medium breakdown SiGe HBTs, 90nm Low Power RF CMOS, and a full suite of passive devices. A design kit supports custom and analog designs and a library of digital functions aids logic and memory design. The technology supports mm-wave and high-performance RF/Analog applications.","PeriodicalId":423269,"journal":{"name":"2014 IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-12-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"79","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE Bipolar/BiCMOS Circuits and Technology Meeting (BCTM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/BCTM.2014.6981293","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 79
Abstract
We present the electrical characteristics of the first 90nm SiGe BiCMOS technology developed for production in IBM's large volume 200mm fabrication line. The technology features 300 GHz fT and 360 GHz fMAX high performance SiGe HBTs, 135 GHz fT and 2.5V BVCEO medium breakdown SiGe HBTs, 90nm Low Power RF CMOS, and a full suite of passive devices. A design kit supports custom and analog designs and a library of digital functions aids logic and memory design. The technology supports mm-wave and high-performance RF/Analog applications.
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