Selective oxidation of vanadium thin film surfaces using an atomic force microscope

S. Sakata, P. Vaccaro, S. Yamaoka, I. Umezu, A. Sugimura
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引用次数: 1

Abstract

We successfully applied the atomic force microscope nano-oxidation process to vanadium thin films for the first time. The oxidized lines were narrower and higher than those of titanium thin films processed under the same conditions, These results show that vanadium is an interesting alternative material for the fabrication of metal/insulator-based nanodevices.
钒薄膜表面的原子力显微镜选择性氧化
我们首次成功地将原子力显微镜纳米氧化工艺应用于钒薄膜。氧化谱线比在相同条件下加工的钛薄膜的谱线窄且高,这些结果表明钒是制造金属/绝缘体基纳米器件的一个有趣的替代材料。
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