Optimisation of optical and electrical properties of ZnO/Au-Pd/ZnO multilayer thin films

D. Dergham, S. Hassani, F. Lekoui, M. Ouchabane, R. Hadj Ali, I. Djemai
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Abstract

For use as transparent conductive oxide, conductive multilayer thin films were created with three alternating layers of metal oxide/metal/ metal oxide. (TCO). Specifically in this work, ZnO/Au-Pd/ZnO multilayer coating system was deposited on glass substrate and characterized. ZnO films were prepared by successive deposition steps consisting of vacuum thermal evaporation of zinc oxide powder, followed by heat treatment at 450 °C. Plasma magnetron sputtering was used to deposit Au-Pd films. the same amount of Au and Pd was used. The thickness of the sputter deposited metallic interlayer (Au-Pd) was varied in order to optimize the optical and electrical properties of the stack. Morphology and microstructure were investigated by SEM and XRD. Four point probe was used to investigate electrical properties. and the transmittance values were measured using a spectrophotometer. Transmittance was measured for multilayer stacks containing Au-Pd interlayer.
ZnO/Au-Pd/ZnO多层薄膜的光电性能优化
作为透明导电氧化物,导电多层薄膜由三层金属氧化物/金属氧化物/金属氧化物交替制成。(TCO)。本文在玻璃基板上沉积了ZnO/Au-Pd/ZnO多层涂层体系,并对其进行了表征。采用真空热蒸发法制备氧化锌薄膜,然后在450℃下进行热处理。采用等离子体磁控溅射沉积Au-Pd薄膜。使用等量的Au和Pd。改变溅射沉积金属间层(Au-Pd)的厚度,以优化镀层的光学和电学性能。采用扫描电镜(SEM)和x射线衍射(XRD)对其形貌和微观结构进行了表征。采用四点探针研究其电学性质。用分光光度计测定了透光率。测量了含有Au-Pd中间层的多层堆叠的透光率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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