III-V HEMTs for Cryogenic Low Noise Amplifiers

J. Grahn, E. Cha, A. Pourkabirian, J. Stenarson, N. Wadefalk
{"title":"III-V HEMTs for Cryogenic Low Noise Amplifiers","authors":"J. Grahn, E. Cha, A. Pourkabirian, J. Stenarson, N. Wadefalk","doi":"10.1109/IEDM13553.2020.9372031","DOIUrl":null,"url":null,"abstract":"The InP HEMT is the preferred transistor technology for cryogenic low-noise amplification from 1 GHz up to 200 GHz. The InP HEMT shows its superiority at temperatures 5 to 15 K and technology development must be made with knowledge about the special circumstances occurring in III- V materials and device operating under cryogenic conditions. We report on how to electrically stabilize the cryogenic two-finger HEMT at low temperature making it possible to design low-noise amplifiers with state of the art noise performance up to mm-wave. We also demonstrate recent progress on optimizing the InP HEMT for cryogenic low-noise amplifier operation below 1 mW dc power dissipation, of interest for qubit readout electronics.","PeriodicalId":415186,"journal":{"name":"2020 IEEE International Electron Devices Meeting (IEDM)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE International Electron Devices Meeting (IEDM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM13553.2020.9372031","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

The InP HEMT is the preferred transistor technology for cryogenic low-noise amplification from 1 GHz up to 200 GHz. The InP HEMT shows its superiority at temperatures 5 to 15 K and technology development must be made with knowledge about the special circumstances occurring in III- V materials and device operating under cryogenic conditions. We report on how to electrically stabilize the cryogenic two-finger HEMT at low temperature making it possible to design low-noise amplifiers with state of the art noise performance up to mm-wave. We also demonstrate recent progress on optimizing the InP HEMT for cryogenic low-noise amplifier operation below 1 mW dc power dissipation, of interest for qubit readout electronics.
低温低噪声放大器的III-V型hemt
InP HEMT是1 GHz至200 GHz低温低噪声放大的首选晶体管技术。InP HEMT在5 ~ 15k温度下表现出其优势,技术开发必须了解III- V材料和器件在低温条件下运行的特殊情况。我们报告了如何在低温下电稳定低温双指HEMT,从而使设计具有最高毫米波噪声性能的低噪声放大器成为可能。我们还展示了在优化InP HEMT方面的最新进展,该器件适用于量子位读出电子学中感兴趣的低于1mw直流功耗的低温低噪声放大器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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