A FinFET pass transistor based XOR and XNOR circuit designed for 18nm technology

Pavan Adulapuram, C. Kumar, Tejaswini Tula, Farasha Mehroz Mohammed Abdul, Sritha Katrapally, Lavan Kumar Pakala
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Abstract

Due to significant short-channel effects scaling circuits for typical single-gate MOSFET’s is extremely difficult. Circuits are scaled down to rise operational speed, consume less space, and improve control over channel by gate configurations. But as a result of diluted geometries, lower supply voltage and higher frequencies all have impact on device, scaling faces a number of challenges. The short-channel effect issue in MOSFETs is subsidized by the use of FinFET. For good control, a second gate is added to double gate device and is placed opposite to first gate. The mostly used subcircuits particularly in arithmetic circuits are EX-OR, EX-NOR circuits which are created to boost speed and power. As a result, EX-OR, EX-NOR circuit which is based on CADENCE VIRTUOSO tool at 18nm, uses a 0.7v supply voltage performs better than a complex logic circuit.
一种基于18nm技术的XOR和XNOR电路的FinFET通管
由于明显的短通道效应,典型的单门MOSFET的缩放电路非常困难。电路按比例缩小,以提高运行速度,消耗更少的空间,并通过栅极配置改善对通道的控制。但由于几何形状的稀释,较低的电源电压和较高的频率都会对器件产生影响,因此缩放面临许多挑战。mosfet中的短通道效应问题通过使用FinFET得到了解决。为了便于控制,在双闸门装置上增加第二闸,并置于第一闸的对面。特别是在算术电路中最常用的子电路是前或、前或或电路,它们是为了提高速度和功率而创建的。因此,基于18nm的CADENCE VIRTUOSO工具的EX-OR, EX-NOR电路使用0.7v电源电压,比复杂逻辑电路性能更好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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