Self-Heating Analysis of GaN-HEMT for Various Ambient Temperature and Substrate Thickness

A. L, Anwar Hasan Mohammed Jarndal, S. Chander, G. D, Raj Kumar J S, S. Bhagyalakshmi, P. K. Reddy, D. Nirmal
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Abstract

Impact of substrate thickness on self-heating effect for AlGaN/GaN HEMT is analyzed. Self-heating effect is analyzed using Technology Computer Aided Design (TCAD) simulation. GaN-HEMT with gate width of 1mm and gate length of 0.7 µm is considered for the analysis. In the simulation, substrate thickness is varied from 100 µm to 200 µm to study its impact on self-heating effect and drain current. In addition, the ambient temperature is varied from 300K to 700K and its impact is analyzed. Impact of gate-gate spacing on thermal performance is also analyzed. Furthermore, Kink effect on drain current at VGS=-2V is observed.
不同环境温度和衬底厚度下GaN-HEMT的自热分析
分析了衬底厚度对AlGaN/GaN HEMT自热效应的影响。采用技术计算机辅助设计(TCAD)仿真分析了自热效应。考虑栅极宽度为1mm,栅极长度为0.7µm的GaN-HEMT进行分析。在模拟中,衬底厚度从100µm变化到200µm,研究其对自热效应和漏极电流的影响。另外,对环境温度在300K ~ 700K范围内的变化进行了分析,并对其影响进行了分析。同时分析了栅极间距对热工性能的影响。此外,在VGS=-2V时,还观察到扭结效应对漏极电流的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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