Subthreshold Behavior of Undoped DG MOSFETs

F. J. Garcla-Satnchez, A. Ortiz-Conde, J. Muci
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引用次数: 10

Abstract

Undoped-body MOSFETs display peculiar semiconductor body thickness dependent subthreshold regions. The very concept of threshold voltage in undoped-body devices is affected by the interpretation given to this behavior. The fundamental subthreshold behavior is examined here from the point of view of its extension and slope factor. Its dependence on technological parameters is analyzed in light of phenomenological considerations. It is found that the subthreshold region may potentially exhibit two coexisting subregions with ideal slope factors of 60 and 120 mV/dec.
未掺杂DG mosfet的亚阈值行为
非掺杂体mosfet显示特殊的半导体体厚度相关的亚阈值区域。在非掺杂体器件中阈值电压的概念受到对这种行为的解释的影响。本文从其延伸性和斜率因子的角度考察了基本的阈下行为。从现象学的角度分析了其对工艺参数的依赖性。发现阈下区域可能存在两个共存的子区域,理想斜率因子为60和120 mV/dec。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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