Suppressing the edge roll off in continuous polishing of large planar optics by using extension blocks

Lele Ren, Fei-hu Zhang, D. Liao, R. Xie, Shi-jie Zhao, Jian Wang
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Abstract

The edge roll off seriously restricts the further improvement of the overall surface figure accuracy in CP of large planar optics. Firstly, the half width and depth of large planar optics’ edge region is proposed to quantify the roll off degree by analyzing its radial equivalent profile. Then, a two-dimensional symmetrical model of the large planar optics and the pitch lap is established. Next, based on the finite element model, the influence of extension block’s bonding state on the large planar optics edge’s stress concentration is analyzed. Finally, the effectiveness of this proposed method is verified by CP of large planar optics with extension blocks.
利用延伸块抑制大型平面光学连续抛光中的边滚
在大型平面光学系统中,边滚问题严重制约着整体曲面精度的进一步提高。首先,通过分析大平面光学元件的径向等效轮廓,提出了大平面光学元件边缘区域的半宽度和半深度来量化滚转程度;然后,建立了大平面光学与俯仰搭接的二维对称模型。其次,在有限元模型的基础上,分析了延伸块的粘结状态对大平面光学边缘应力集中的影响。最后,通过带扩展块的大型平面光学元件的CP验证了该方法的有效性。
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