Interfaces in crystalline materials

F. Flores, R. Saiz-Pardo, R. Rincón
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引用次数: 618

Abstract

A brief review of the theoretical state of the art in the field of semiconductor interfaces is presented. It is shown that the important factor controlling the different semiconductor barrier heights is the density of states associated with the semiconductor dangling-bonds. passivated semiconductor surfaces present saturated dangling-bonds and have modified barrier heights. Results for hydrogen-passivated GaAs (110)-surfaces are presented; it is shown that the Schottky-barrier height formed by the deposition of a K-layer is sustantially changed by the hydrogen-passivation.
晶体材料中的界面
简要回顾了半导体接口领域的理论现状。结果表明,控制不同势垒高度的重要因素是与半导体悬键相关的态密度。钝化后的半导体表面呈现出饱和的悬键,并改变了势垒高度。给出了氢钝化GaAs(110)表面的结果;结果表明,氢钝化使k层沉积形成的肖特基势垒高度发生了很大的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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